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FILM-FORMING DEVICE METHOD FOR MEASURING FILM THICKNESS OF ORGANIC FILM AND FILM THICKNESS SENSOR FOR ORGANIC FILM
FILM-FORMING DEVICE METHOD FOR MEASURING FILM THICKNESS OF ORGANIC FILM AND FILM THICKNESS SENSOR FOR ORGANIC FILM
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机译：用于测量有机膜的膜厚的成膜装置方法和用于有机膜的膜厚传感器
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摘要
[PROBLEMS] To provide a film forming apparatus capable of performing film formation rate control and film thickness measurement of an organic film with high accuracy, a method for measuring film thickness of an organic film, and a film thickness sensor for organic film. Solution The film forming apparatus 10 includes a vacuum chamber 11, an organic material source 12, a substrate holder 13, a film thickness sensor 14, and a measurement unit 17. The organic material source 12 is disposed inside the vacuum chamber 11 and is configured to be capable of emitting organic material particles. The substrate holder 13 is disposed to face the organic material source 12 and is configured to be able to hold the substrate W. As shown in FIG. The film sensor 14 is disposed inside the vacuum chamber 11 and has a crystal oscillator having a fundamental frequency of 4 MHz or less. The measuring unit 17 measures the film thickness of the organic film deposited on the substrate W on the substrate holder 13 based on the change in the resonance frequency of the crystal oscillator.
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