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SMALL CONE TYPE MICROWAVE ECR PLASMA SOURCE FOR PROCESSING AND INJECTING ION BEAM
SMALL CONE TYPE MICROWAVE ECR PLASMA SOURCE FOR PROCESSING AND INJECTING ION BEAM
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机译：用于处理和注入离子束的小锥型微波ECR等离子体源
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摘要
Disclosed is a small cone type microwave ECR plasma source for processing and injecting an ion beam. According to the present invention, the microwave ECR plasma source may include an input unit, a body unit, and an output unit. The input unit, body unit, and output unit are detachable. The input unit may include a plasma gas supply unit, a microwave supply unit, a coaxial cable type power application unit, and a cooling water supply unit. The body unit may include a conical inner conductor formed with a radial slit and a permanent magnet arranged outside the outer conductor to form magnetic field corresponding to electromagnetic wave passing through the slit. The output unit may include an extraction electrode for extracting an ion beam and a neutralizer for supplying electrons to the ion beam. The microwave ECR plasma source is capable of extracting a high ion beam current from a high density plasma generated by ECR phenomenon induced from the permanent magnet.;COPYRIGHT KIPO 2019
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