首页> 外国专利> CHEMICAL SOLUTION MANAGEMENT SYSTEM FOR SUBSTRATE PROCESSING APPARATUS CALCULATION METHOD OF CHEMICAL SOLUTION MANAGEMENT CHARGE FOR SUBSTRATE PROCESSING APPARATUS AND CHEMICAL SOLUTION MANAGEMENT CHARGE CALCULATION SYSTEM FOR SUBSTRATE PROCESSING APPARATUS

CHEMICAL SOLUTION MANAGEMENT SYSTEM FOR SUBSTRATE PROCESSING APPARATUS CALCULATION METHOD OF CHEMICAL SOLUTION MANAGEMENT CHARGE FOR SUBSTRATE PROCESSING APPARATUS AND CHEMICAL SOLUTION MANAGEMENT CHARGE CALCULATION SYSTEM FOR SUBSTRATE PROCESSING APPARATUS

机译：基板处理装置的化学溶液管理系统基板处理装置的化学溶液管理费用的计算方法以及基板处理装置的化学溶液管理费用的计算系统

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摘要

An objective of the present invention is to provide a chemical solution management system for a substrate processing apparatus, which is optimal to a service of managing a chemical solution used in manufacturing a substrate in an optimal condition, a calculation method of a chemical solution management charge for the substrate processing apparatus, and a chemical solution management charge calculation system for the substrate processing apparatus. To achieve the objective, the chemical solution management system of the present invention comprises: a chemical solution preparation device which prepares a new solution of a chemical solution; a chemical solution recycling device which recycles a used chemical solution; and other devices, wherein the substrate processing apparatus, the chemical solution preparation device, the chemical solution recycling device, and the other devices are connected by pipes having integrating flow meters. The chemical solution management system further comprises a concentration management device which always manages the chemical solution to an optimal concentration by measuring concentration of the chemical solution of the substrate processing apparatus and supplementing an undiluted solution or new solution of the chemical solution, and a recycled solution. Flow rate integration of a supplied supplemented solution is measured by the integrating flow meters, and the integrating flow meters is directly connected to a network.

机译：本发明的目的是提供一种基板处理装置的药液管理系统，该系统对于在最佳条件下管理用于制造基板的药液的服务是最佳的，药液管理费用的计算方法。基板处理装置的化学药品管理费计算系统。为了实现该目的，本发明的药液管理系统包括：药液制备装置，其制备药液的新溶液。化学溶液回收装置，其回收用过的化学溶液;基板处理装置，药液调制装置，药液回收装置及其他装置通过具有积分流量计的配管连接。化学溶液管理系统还包括浓度管理装置，该浓度管理装置通过测量基板处理装置的化学溶液的浓度并补充化学溶液的未稀释溶液或新溶液来始终将化学溶液管理到最佳浓度，以及再循环溶液。。通过积分流量计测量所提供的补充溶液的流量积分，并将积分流量计直接连接到网络。

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公开/公告号KR20180129600A

专利类型
公开/公告日2018-12-05

原文格式PDF
申请/专利权人 HIRAMA LABORATORIES CO. LTD.;
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申请/专利号KR20170161414
发明设计人 NAKAGAWA TOSHIMOTO;
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申请日2017-11-29
分类号G03F7/20;G03F7/30;G03F7/42;G06Q30/02;H01L21/67;
国家 KR
入库时间 2022-08-21 11:52:26

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