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OLED SELECTIVE FORMING METHOD FOR THIN FILM BY SOLUTION PROCESS OF ORGANIC SEMICONDUCTOR DEVICE ANTI-FORMING FILM USED FOR THE METHOD AND MANUFACTURING METHOD FOR OLED LIGHT BY SOLUTION PROCESS
OLED SELECTIVE FORMING METHOD FOR THIN FILM BY SOLUTION PROCESS OF ORGANIC SEMICONDUCTOR DEVICE ANTI-FORMING FILM USED FOR THE METHOD AND MANUFACTURING METHOD FOR OLED LIGHT BY SOLUTION PROCESS
The present invention relates to a method for selectively forming a thin film only in a part required in a process of manufacturing an organic semiconductor device by a solution process, which comprises the steps of: placing an anti-coating film on a part where a thin film is not formed; coating the entire surface including an upper side of the anti-coating film with a solution; curing the solution to form the thin film; and removing the anti-coating film to remain the thin film only on a remaining part. The anti-coating film is made of polydimethylsiloxane (PDMS) which is not applied with an adhesive. In order to selectively form a thin film only on a required part, an adhesive is not used but an anti-coating film made of PDMS in which the surface energy is adjusted, thereby applying a solution process without a problem of remaining the adhesive or pollutants attached to the adhesive and a problem occurring in a laser scribing process. Also, the large-area OLED illumination can be manufactured by a solution process so manufacturing costs thereof are greatly reduced, thereby commercializing the OLED illumination having excellent energy efficiency.
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