首页> 外国专利> SYSTEM FOR DEPOSITING SLIM FILMS OF METALS, SEMICONDUCTING MATERIALS, DIELECTRIC MATERIALS OR POLYMERS IN THE INNER OR OUTER SURFACE OF A TUBE USING THE AEROSOL ASSISTED CHEMICAL VAPOR DEPOSITION TECHNIQUE.

SYSTEM FOR DEPOSITING SLIM FILMS OF METALS, SEMICONDUCTING MATERIALS, DIELECTRIC MATERIALS OR POLYMERS IN THE INNER OR OUTER SURFACE OF A TUBE USING THE AEROSOL ASSISTED CHEMICAL VAPOR DEPOSITION TECHNIQUE.

机译：用于使用气溶胶辅助化学气相沉积技术在管子内部或外部沉积薄金属膜，半导电材料，介电材料或聚合物的系统。

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摘要

The present invention refers to the development of a system for the production of slim films of metallic materials, pure or doped, dielectric or polymeric semiconductors in the inner or outer portion of a tube made of glass, metal or ceramic, which is useful as a substrate, using the aerosol assisted chemical vapor deposition. Once a slim film is obtained in the inner or outer portion of the tube-substrate, it is possible to synthesize a new film of the same or different material over the previous film for obtaining a multilayer structure, which may be obtained in different thicknesses. In addition, the size of the tube-substrate may vary for obtaining slim films with different coated areas.

机译：本发明涉及系统的开发，该系统用于在玻璃，金属或陶瓷制成的管的内部或外部中生产金属材料，纯的或掺杂的，电介质或聚合物半导体的薄膜，该薄膜可用作玻璃，使用气雾剂辅助化学气相沉积来沉积基材。一旦在管基板的内部或外部获得了薄的膜，就可以在先前的膜上合成具有相同或不同材料的新膜，以获得多层结构，该多层结构可以以不同的厚度获得。另外，为了获得具有不同涂覆面积的薄膜，管基底的尺寸可以变化。

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公开/公告号MX362723B

专利类型
公开/公告日2018-11-22

原文格式PDF
申请/专利权人 CENTRO DE INVESTIGACION EN MATERIALES AVANZADOS S.C.;
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申请/专利号MX20120005462
发明设计人 MARIO MIKI YOSHIDA;PATRICIA AMEZAGA MADRID;EDNA IRIS RIOS VALDOVINOS;JOSE FRANCISCO POLA ALBORES;PEDRO PIZA RUIZ;
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申请日2012-05-10
分类号C23C16/448;B32B1/08;C23C16/455;C23C16/458;
国家 MX
入库时间 2022-08-21 12:01:42

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