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Pattern quality management chart, pattern quality management method, and pattern formation method

机译:图案质量管理图,图案质量管理方法和图案形成方法

摘要

A pattern quality management chart includes a chart substrate which is made of the same material as a substrate patterned by a first region having a predetermined affinity to a functional liquid for pattern formation and a second region having an affinity lower than the predetermined affinity, and at least one unit region group formed on the surface of the chart substrate. The unit region group includes a plurality of unit regions which are constituted of the first region surrounded therearound by the second region, and each of the unit regions is classified into either a compliant type unit region which has a shape and a size such that, when a predetermined amount of functional liquid is supplied to the unit region under predetermined supply conditions, the functional liquid does not overflow into the surrounding second region and the unit region is completely filled with the functional liquid, or a non-compliant type unit region which has a shape and a size such that part of the functional liquid overflows into the surrounding second region and/or a part of the unit region is not filled with the functional liquid. A plurality of unit regions include at least one compliant type unit region and at least one non-compliant type unit region.
机译:图案质量管理图包括由与由用于图案形成的功能液具有预定亲和力的第一区域和具有低于预定亲和力的亲和力的第二区域图案化的衬底相同的材料制成的图表衬底。在图表基板的表面上形成至少一个单位区域组。单位区域组包括由被第二区域围绕的第一区域构成的多个单位区域,并且每个单位区域被分类为顺应型单位区域,其形状和大小使得在预定的供应条件下,将预定量的功能液体供应到单位区域,功能液体不会溢出到周围的第二区域中,并且该单位区域完全充满了功能液体,或者是具有其形状和尺寸使得功能液的一部分溢出到周围的第二区域中和/或单位区域的一部分没有被功能液填充。多个单位区域包括至少一个顺应类型单位区域和至少一个不顺应类型单位区域。

著录项

  • 公开/公告号US10197659B2

    专利类型

  • 公开/公告日2019-02-05

    原文格式PDF

  • 申请/专利权人 FUJIFILM CORPORATION;

    申请/专利号US201615070444

  • 发明设计人 TAKEICHI TATSUTA;

    申请日2016-03-15

  • 分类号G01R35/00;B41J11/00;B05D1/26;G01R31/28;H05K3/12;

  • 国家 US

  • 入库时间 2022-08-21 12:08:56

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