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蒸着マスクの製造方法及び加工マスク

机译:气相沉积掩模的制造方法及掩模

摘要

To provide a method for manufacturing a vapor deposition mask by which shortening of a processing time can be achieved while reducing variation in an opening dimension, and a processing mask.SOLUTION: A method for manufacturing a vapor deposition mask having plural open holes. According to this method, a processing mask 1 is set to a movement start position by a mobile device 4 on which the processing mask is loaded, a processing object 9 is positioned at a processing position, at which an open hole 91 is formed in a processing face which becomes an irradiation area of laser beam L, by a stage device 7 on which the processing object is loaded, the processing mask is moved according to a predetermined processing route from the movement start position, and laser beam is emitted at each time when a mark region M is detected by an optical sensor 5 in association with movement of the processing mask. Laser beam, which has penetrated a light transmitting region associated with the mark region at each time of emission of laser beam, is reduced and projected onto the processing face until formation of an open hole. A series of processing from setting of the processing mask to the movement start position to reduced projection of laser beam onto the processing face is repeated until formation of a predetermined number of open holes is ended.SELECTED DRAWING: Figure 6
机译:提供一种用于制造气相沉积掩模的方法和方法,该方法可以在缩短开口尺寸的同时缩短加工时间,并且提供一种加工掩模。解决方案:一种用于制造具有多个开孔的气相沉积掩模的方法。根据该方法,通过安装有处理掩模的移动设备4将处理掩模1设置到移动开始位置,将处理对象9定位在在其上形成有开孔91的处理位置。成为载有被处理物的载物台装置7,成为成为激光L的照射区域的被处理面,从移动开始位置起按照规定的处理路径使处理掩模移动,并每次射出激光。当光学传感器5与处理掩模的移动相关联地检测到标记区域M时。在每次发射激光束时已穿透与标记区域相关的透光区域的激光束被减小并投射到处理面上,直到形成裸眼。重复从设置加工掩模到移动开始位置到减少激光束在加工面上的投射等一系列加工,直到结束预定数量的开口孔的形成为止。图6

著录项

  • 公开/公告号JP2019042762A

    专利类型

  • 公开/公告日2019-03-22

    原文格式PDF

  • 申请/专利权人 V TECHNOLOGY CO LTD;

    申请/专利号JP20170167397

  • 发明设计人 松山 将太;柳川 良勝;

    申请日2017-08-31

  • 分类号B23K26/384;B23K26/00;B23K26/066;C23C14/04;

  • 国家 JP

  • 入库时间 2022-08-21 12:24:21

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