首页> 外国专利> RESIN COMPOSITION, CURED FILM, METHOD FOR PRODUCING RELIEF PATTERN OF CURED FILM, ELECTRONIC COMPONENT, SEMICONDUCTOR DEVICE, METHOD FOR PRODUCING ELECTRONIC COMPONENT, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

RESIN COMPOSITION, CURED FILM, METHOD FOR PRODUCING RELIEF PATTERN OF CURED FILM, ELECTRONIC COMPONENT, SEMICONDUCTOR DEVICE, METHOD FOR PRODUCING ELECTRONIC COMPONENT, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

机译:树脂组合物,固化膜,固化膜的凹凸图案的制造方法,电子部件,半导体装置,电子部件的制造方法以及半导体装置的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a resin composition for abrasion machining that gives a cured film that can be cured at a low temperature of 200°C or less and yet allows fine patterning with UV laser, and yields highly reliable electronic components and semiconductor devices.;SOLUTION: A resin composition for abrasion machining using UV laser, contains (a) resin and (b) solvent, the (a) resin having a polyimide precursor structure with an imidization rate of 5% or more and less than 90%.;SELECTED DRAWING: Figure 3;COPYRIGHT: (C)2019,JPO&INPIT
机译:解决的问题:提供一种用于磨削加工的树脂组合物,该组合物产生的固化膜可以在200°C或更低的低温下固化,但仍可以用UV激光进行精细图案化,并生产出高度可靠的电子元件和半导体器件解决方案:一种用于使用UV激光进行磨削加工的树脂组合物,包含(a)树脂和(b)溶剂,(a)具有聚酰亚胺前体结构的酰亚胺化率为5%以上且小于90%的树脂。 ;选定的图纸:图3;版权:(C)2019,JPO&INPIT

著录项

  • 公开/公告号JP2019123864A

    专利类型

  • 公开/公告日2019-07-25

    原文格式PDF

  • 申请/专利权人 TORAY IND INC;

    申请/专利号JP20190001645

  • 发明设计人 MASUDA YUKI;TOMIKAWA MASAO;

    申请日2019-01-09

  • 分类号C08L79/08;C08G73/10;C08L33/04;C08K5/13;C08K5/17;H01L23/12;

  • 国家 JP

  • 入库时间 2022-08-21 12:24:19

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