PROBLEM TO BE SOLVED: To efficiently raise the temperature of a sheet type substrate to be processed under a vacuum in a short time and further to suppress energy consumption.;SOLUTION: The present invention relates to a heating apparatus 1 that heats a sheet type substrate S to be processed under a vacuum and that comprises: chambers 11, 21 having a first room SP1 and a second room SP2 capable of storing a substrate; a first shutter which opens and closes the first room to and from the outside space; a second shutter S2 which opens and closes the first room and second room to and from each other; first pressure reduction parts 14, 15 which reduce the pressure in the first room; second pressure reduction parts 25, 26 and 27 which reduce the pressure in the second room; carrying mechanisms 12, 22 which carry the substrate from the first room reduced in pressure to the second room reduced in pressure; a uniform heating part 24 which imparts a heat, substantially uniform in quantity of heat in a plane of the substrate, to the substrate having been conveyed to the second room to heat the substrate; and a local heating part 23 which imparts a locally large quantity of heat to the substrate being carried from the first room to the second room.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2019,JPO&INPIT
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