首页> 外国专利> SYSTEM AND METHOD FOR ADJUSTING PRESSURE IN A SUBSURFACE RESERVOIR AND SYSTEM FOR PRODUCING AT LEAST ONE GAS FOR ADJUSTING PRESSURE IN A SUBSURFACE RESERVOIR

SYSTEM AND METHOD FOR ADJUSTING PRESSURE IN A SUBSURFACE RESERVOIR AND SYSTEM FOR PRODUCING AT LEAST ONE GAS FOR ADJUSTING PRESSURE IN A SUBSURFACE RESERVOIR

机译:用于调节地下储层压力的系统和方法以及用于生产至少一种用于调节地下储层压力的气体的系统

摘要

A system for adjusting pressure in a reservoir (1) includes a pump system (33) for pumping a fluid into the reservoir (1) and a system for supplying the fluid to the pump system (33). The fluid supply system includes a conversion device (24) arranged to receive a fuel and a gas mixture comprising at least one oxidant, to react the fuel with the gas mixture and to supply fluid obtained upon reaction, the fluid supply system being arranged to supply at least a portion of that fluid. The fluid supply system further includes a source of the fuel. The fuel comprises hydrogen. The conversion device (24) is arranged to react the fuel with a gas mixture comprising predominantly nitrogen.
机译:用于调节贮存器(1)中的压力的​​系统包括用于将流体泵送到贮存器(1)中的泵系统(33)和用于将流体供应到泵系统(33)的系统。流体供应系统包括转换装置(24),转换装置(24)布置成接收燃料和包含至少一种氧化剂的气体混合物,以使燃料与气体混合物反应并供应反应后获得的流体,流体供应系统布置成供应至少一部分流体。流体供应系统还包括燃料源。燃料包含氢。转换装置(24)布置成使燃料与主要包含氮气的气体混合物反应。

著录项

  • 公开/公告号EP3470621A1

    专利类型

  • 公开/公告日2019-04-17

    原文格式PDF

  • 申请/专利权人 L2 CONSULTANCY B.V.;

    申请/专利号EP20150000094

  • 发明设计人 VAN LOOKEREN CAMPAGNE CONSTANT JOHAN;

    申请日2019-01-02

  • 分类号E21B43/16;C01B21/04;C01B3/34;

  • 国家 EP

  • 入库时间 2022-08-21 12:27:56

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