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METHOD OF CONTROL OF CONSTRUCTION WITH MIS-STRUCTURE IN THIN-FILM TRANSISTORS AND SYSTEM FOR IMPLEMENTATION OF CONTROL
METHOD OF CONTROL OF CONSTRUCTION WITH MIS-STRUCTURE IN THIN-FILM TRANSISTORS AND SYSTEM FOR IMPLEMENTATION OF CONTROL
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机译：薄膜晶体管中MIS结构的施工控制方法及实施系统
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摘要
FIELD: images forming devices.;SUBSTANCE: invention relates to the field of liquid crystal display technology, in particular to the control of a structure with a MIS structure (metal-insulator-semiconductor structure) in TFT (thin-film transistors) and its system. Method for controlling a structure with a MIS structure (a metal-insulator-semiconductor structure) in a TFT (thin-film transistors) is disclosed. In the method for controlling the construction with a MIS structure in the TFT, a dielectric constant of silicon nitride in the MIS structure is calculated by calculation way is obtained. It is evaluated whether the dielectric constant of silicon nitride reaches a value specified in the TFT manufacturing procedure. Parameters of the MIS structure are adjusted so that after adjustment, the dielectric constant of the silicon nitride in the MIS structure of the value specified in the TFT manufacturing procedure is achieved.;EFFECT: technical result is to improve the functioning and stability of liquid crystal displays on thin-film transistors by effectively monitoring the construction of the MIS structure.;9 cl, 9 dwg
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