首页> 外国专利> METHOD AND DEVICE FOR FORMING MICROCHANNELS ON SUBSTRATES FROM OPTICAL GLASS, OPTICAL CRYSTALS AND SEMICONDUCTOR MATERIALS BY FEMTOSECOND IMPULSES OF LASER RADIATION

METHOD AND DEVICE FOR FORMING MICROCHANNELS ON SUBSTRATES FROM OPTICAL GLASS, OPTICAL CRYSTALS AND SEMICONDUCTOR MATERIALS BY FEMTOSECOND IMPULSES OF LASER RADIATION

机译:利用毫微秒脉冲激光辐射在光学玻璃,光学晶体和半导体材料上形成微通道的方法和装置

摘要

FIELD: instrument engineering.;SUBSTANCE: invention relates to the field of optical instrument making, namely laser microprocessing and can be used to form microchannels on the surface of substrates made of glass, crystals and semiconductor materials in the manufacture of optical scales, grids, gratings and other devices. Method for forming the microchannels includes irradiating the surface of the substrate with laser radiation with a femtosecond pulse duration and an ultraviolet wavelength, visible or near infrared range. Laser beam is scanned in a linear raster method along the rows for the length of the microprocessing section with idle zones, one or more microprocessing raster areas that fit the width of the microchannel. In each line, the first pulse is radiated on one boundary of the microprocessing section, and the last – on its other border, the duration of the burst is less than the maximum length of the microprocessing section, at which defects do not appear in the substrate. Distance between lines is not exceeding their width. Length of each idling zone is 5–25 % of the length of the microprocessing section. Raster angle relative to the forming at each point of one of the contours of the raster microprocessing zone is from 35° up to 90°. Laser, systems of formation, two-coordinate scanning and focusing of the beam and the system of positioning and fixing the substrate are connected with the control computer.;EFFECT: technical result is to improve quality of microchannels and the formation of various profiles of microchannels.;10 cl, 2 dwg
机译:激光加工技术领域本发明涉及光学仪器制造领域,即激光微加工,可用于在制造光学尺,栅格,光栅等设备。形成微通道的方法包括用飞秒脉冲持续时间和紫外波长,可见或近红外范围的激光辐射照射衬底的表面。激光束以线性光栅方法沿着具有空闲区域,适合微通道宽度的一个或多个微处理光栅区域的行沿着微处理部分的长度扫描。在每条线中,第一个脉冲在微处理部分的一个边界上辐射,最后一个脉冲在其另一边界上,脉冲串的持续时间小于微处理部分的最大长度,在该最大长度处,缺陷没有出现。基质。线之间的距离不超过其宽度。每个空转区的长度为微处理段长度的5-25%。相对于栅格微处理区域轮廓之一的每个点处的成形的栅格角度为35°至90°。激光,光束的形成系统,光束的二坐标扫描和聚焦以及基板的定位和固定系统都与控制计算机相连。效果:技术成果是提高微通道的质量和微通道的各种轮廓的形成。; 10厘升,2载重吨

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号