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首页> 外国专利> METHOD FOR PROCESSING POLYIMIDE FILM IN THE FLAME OF NONEQUILIBRIUM HETEROGENEOUS LOW-TEMPERATURE MICROWAVE PLASMA UNDER ATMOSPHERIC PRESSURE

METHOD FOR PROCESSING POLYIMIDE FILM IN THE FLAME OF NONEQUILIBRIUM HETEROGENEOUS LOW-TEMPERATURE MICROWAVE PLASMA UNDER ATMOSPHERIC PRESSURE

机译：大气压力下非均质低温微波等离子体火焰中聚酰亚胺膜的制备方法

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FIELD: electronic equipment.;SUBSTANCE: invention relates to microelectronics technology, namely to the manufacture of microelectronics products containing a "polyimide film-metal" glue adhesion compound in the construction. In particular, the treatment of a polyimide film in the flare of a nonequilibrium heterogeneous low-temperature microwave plasma at atmospheric pressure using a mixture of argon and oxygen as a buffer gas has been proposed, and relative motion of the film and plasma flame at a repetition rate of excitation pulses of not less than 50 Hz and the pulse ration of 2.6–2.85. Consumed power of the microwave plasma generator is not more than 500 W. Plasma torch has a cylindrical shape. Processing speed is from 10 to 100 mm/s.;EFFECT: as a result, without a preliminary mechanical and chemical treatment of the polyimide film, it is possible to create a reproducible surface for the formation of the "polyimide-metal" adhesive compound.;4 cl, 8 dwg, 1 tbl
机译：技术领域本发明涉及微电子技术，即涉及在建筑中包含“聚酰亚胺膜-金属”胶粘剂的微电子产品的制造。特别地，已经提出了在大气压下使用氩气和氧气的混合物作为缓冲气体在非平衡非均质低温微波等离子体的火炬中处理聚酰亚胺膜的方法，并且该膜和等离子体火焰在室温下的相对运动是在室温下进行的。激励脉冲的重复频率不小于50 Hz，脉冲比为2.6–2.85。微波等离子体发生器的消耗功率不超过500W。等离子炬具有圆柱形状。加工速度为10到100 mm / s。效果：结果，无需对聚酰亚胺膜进行初步的机械和化学处理，就可以形成可复制的表面，以形成“聚酰亚胺-金属”粘合剂化合物。; 4厘升，8载重吨，1桶

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