首页> 外国专利> A PRETREATING-ACTIVATING SOLUTION FOR AN ELECTROLESS NICKEL PLATING A METHOD FOR ELECTROLESS PLATING A THIN-NICKEL AND A METHOD FOR SURFACE-TREATING USING THE SAME AND A PRINTED CIRCUIT BOARD COMPRISING AN ELECTROLESS THIN-NICKEL

A PRETREATING-ACTIVATING SOLUTION FOR AN ELECTROLESS NICKEL PLATING A METHOD FOR ELECTROLESS PLATING A THIN-NICKEL AND A METHOD FOR SURFACE-TREATING USING THE SAME AND A PRINTED CIRCUIT BOARD COMPRISING AN ELECTROLESS THIN-NICKEL

机译:化学镀镍的预处理-活化溶液,化学镀薄镍的方法以及使用该方法和包含电子薄镍的印刷电路板进行表面处理的方法

摘要

According to the present invention, there is provided a pretreating-activating solution for electroless nickel plating including a palladium compound, ammonium salt, a pH adjuster, a copper ion elution inhibitor, and an EO/PO copolymer represented by the following formula (1) as a stabilizer, an ultra-thin electroless Ni plating method using the same, resultant ultra-thin electroless Ni plating, and a printed circuit board including the same. The ultra-thin electroless Ni plating manufactured through an improved Thin-ENEPIG process according to the present invention and the printed circuit board including the same (1) has no void or erosion at the interface between a copper surface and the ultra-thin electroless Ni plating (Thin-Ni), (2) has a reduced stress because it has the form of an amorphous soft Ni plating film, (3) has no circuit spread in the microcircuit, (4) has no surface defect such as pinholes and skip plating in the surface of the final microcircuit (Au plated layer), (5) is highly reliable and excellent in performance and physical properties such as solderability, wire bonding properties, surface uniformity, and corrosion resistance, and (6) addresses problems of the related art by means of a total Ni/Pd/Au plating thickness of 0.5 to 0.7 micrometers, and thus (7) can be utilized in manufacturing a printed circuit board having a very fine pattern with a line/space of 20 to 10 micrometers/20 to 10 micrometers and an ultra fine pattern with a line/space of 10 micrometers/10 micrometers or less.
机译:根据本发明,提供了一种用于化学镀镍的预处理活化溶液,其包括由下式(1)表示的钯化合物,铵盐,pH调节剂,铜离子洗脱抑制剂和EO / PO共聚物。作为稳定剂,使用其的超薄化学镀镍方法,所得的超薄化学镀镍和包括该方法的印刷电路板。通过根据本发明的改进的薄ENEPIG工艺制造的超薄化学镀镍和包括该超薄化学镀镍的印刷电路板(1)在铜表面和超薄化学镀镍之间的界面处没有空隙或腐蚀。镀层(薄镍),(2)由于具有非晶态软镍镀膜的形式而降低了应力,(3)在微电路中没有散布电路,(4)没有针孔和漏斗之类的表面缺陷(5)在最终的微电路表面镀金(Au镀层)是高度可靠的,并且在性能和物理特性(如可焊性,引线键合特性,表面均匀性和耐腐蚀性)方面极好,并且(6)解决了该问题。现有技术通过总的Ni / Pd / Au镀层厚度为0.5到0.7微米,因此(7)可以用于制造具有非常精细的图案的线/间距为20到10微米/ 20至10微米线/间隔为10微米/ 10微米或更小的超精细图案。

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