首页>
外国专利>
6 Preparation method of Porous Silica substrate structure supported Nanoscale Zero-Valent Iron Porous Silica substrate structure made by the same and Their Application for the Reductive Removal of Hexavalent Chromium Heavy Metal Present
6 Preparation method of Porous Silica substrate structure supported Nanoscale Zero-Valent Iron Porous Silica substrate structure made by the same and Their Application for the Reductive Removal of Hexavalent Chromium Heavy Metal Present
The present invention relates to a manufacturing method of a nanoscale zerovalent iron-supported porous silica structure, and the nanoscale zerovalent iron-supported porous silica structure manufactured thereby. More specifically, the present invention relates to a manufacturing method of a nanoscale zerovalent iron-supported porous silica structure, the manufacturing method comprising the steps of preparing a porous silica with a specific form by using a polymer template, and supporting nanoscale zerovalent iron (NZVI) on the surface of the porous silica, thereby reforming the porous silica, the nanoscale zerovalent iron-supported porous silica structure manufactured thereby, and removal of hexavalent chromium using the NZVI-supported porous silica structure. The porous silica structure having NZVI supported on the surface thereof according to the present invention enables the manufacturing method and characteristics of the structure to solve problems such as drop in reduction removal efficiency and the like due to easy surface oxidation of the NZVI as well as an agglomeration phenomenon of nanoparticles basically owned by the NZVI. Further, the porous silica structure having NZVI supported on the surface thereof according to the present invention exhibits excellent efficiency for reduction removal of hexavalent chromium when applying the porous silica structure in the treatment of an aqueous solution containing hexavalent chromium heavy metals.
展开▼