首页>
外国专利>
PATTERN FORMING METHOD FOR LIQUID CRYSTAL ALIGNMENT OF ZENITHAL BI-STABLE LIQUID CRYSTAL PANEL, LIQUID CRYSTAL-ALIGNED SUBSTRATE INCLUDING PATTERN FORMED THEREBY, AND MASK SUBSTRATE USED IN FORMATION OF PATTERN
PATTERN FORMING METHOD FOR LIQUID CRYSTAL ALIGNMENT OF ZENITHAL BI-STABLE LIQUID CRYSTAL PANEL, LIQUID CRYSTAL-ALIGNED SUBSTRATE INCLUDING PATTERN FORMED THEREBY, AND MASK SUBSTRATE USED IN FORMATION OF PATTERN
Disclosed are a pattern forming method for liquid crystal alignment of a zenithal bi-stable liquid crystal panel, a liquid crystal-aligned substrate including a pattern formed thereby, and a mask substrate used in the formation of the pattern, the method forming an asymmetric pattern on a liquid crystal-aligned film of a zenithal bi-stable liquid crystal panel so as to maintain liquid crystal orientation even at zero potential after a voltage is applied, thereby enabling unnecessary power consumption to be prevented or minimized.
展开▼
