首页> 外国专利> METHOD OF CREATING PLASMA IN A PLASMA NOZZLE UNDER ATMOSPHERIC PRESSURE AND REGULATION OF E AND H INTENSITIES OF ELECTROMAGNETIC FIELD AND TRANSFER AND REGULATION OF ACTIVE POWER FLOW FROM A HIGH FREQUENCY SOURCE INTO PLASMA OF THE NOZZLE PLASMA AND A DEVICE FOR ITS IMPLEMENTATION

METHOD OF CREATING PLASMA IN A PLASMA NOZZLE UNDER ATMOSPHERIC PRESSURE AND REGULATION OF E AND H INTENSITIES OF ELECTROMAGNETIC FIELD AND TRANSFER AND REGULATION OF ACTIVE POWER FLOW FROM A HIGH FREQUENCY SOURCE INTO PLASMA OF THE NOZZLE PLASMA AND A DEVICE FOR ITS IMPLEMENTATION

机译:大气压力下在等离子体喷嘴中产生等离子体的方法以及电磁场的E和H强度的调节,以及从高频源向等离子体的等离子体的有功功率流的传递和调节及其实现装置

摘要

A method of regulation of E and H intensities of electromagnetic field and transfer and regulation of active power flow from at least one high frequency source and/or a 3-300 MHz periodic signal mixer into plasma, at a state of minimum magnitude of power reflected back to a high frequency source of at least one plasma nozzle through which a working medium flows, wherein a specific active power flow density is converted/consumed into desired physical and chemical processes and reactions, wherein formation or modification of substances in a solid, liquid or gaseous state in the plasma inside and/or outside the plasma nozzle, wherein the transmission of high- frequency electromagnetic energy is generated and controlled by means of a spatially arranged set of resonant circuitry with spread parameters in the presence of plasma, the shaping space of which or a portion thereof is located inside a space geometrically defined by a complete set of the resonant circuit with spread parameters, wherein the transmission of the high-frequency electromagnetic energy is also regulated by means of an element regulating the spatial distribution o the electromagnetic field, wherein by means of regulation thereof, a state of minimum power reflected back to the high- frequency source is achieved, as well as formation of components of the electromagnetic field described by the electrical and magnetic intensities E and H and the flow of the active power density in each part of the plasma volume. A device for performing the method, wherein a resonant circuit (15) with distributed parameters comprises at least one electromagnetic wave retarding structure (19) and at least one resonant structure/system (14) and a resonator formed by a shading shield (6) of the space (x) geometrically defined by the resonant circuit (15) system, wherein it further comprises at least one shaping space (16) within the space (x), wherein the shaping space (16) extends, in its entirety or partially, into at least one discharge space (17) through which the working medium flows, and further comprises plasma, wherein the resonant circuit (15) is provided with at least one element (18) regulating the spatial distribution of the electromagnetic field and active power flow density, which is arranged on at least one plasma nozzle (1).
机译:一种在功率反射幅度最小的状态下调节E和H电磁场强度以及从至少一个高频源和/或3-300 MHz周期信号混合器向等离子体传输和调节有功功率流的方法返回至少一个工作介质流经的等离子喷嘴的高频源,其中将特定的有功功率流密度转换/消耗为所需的物理和化学过程和反应,其中在固体,液体中形成或修饰物质等离子体喷嘴内部和/或外部的等离子体中处于气态或气态,其中高频电磁能量的传输是通过在等离子体存在的情况下通过空间分布的一组共振电路来产生和控制的,该共振电路具有扩展参数,成型空间其中的一部分或其中一部分位于由具有扩展参数的整套谐振电路几何限定的空间内还通过调节电磁场的空间分布的元件来调节高频电磁能的传输,其中通过调节电磁场的空间,实现了反射回高频源的最小功率的状态,以及由电和磁强度E和H以及等离子体各部分中的有功功率密度流所描述的电磁场分量的形成。一种执行该方法的装置,其中具有分布参数的谐振电路(15)包括至少一个电磁波延迟结构(19)和至少一个谐振结构/系统(14)以及由遮光罩(6)形成的谐振器由谐振电路(15)系统在几何上限定的空间(x)的一部分,其中它还包括在空间(x)内的至少一个成形空间(16),其中成形空间(16)整体或部分地延伸进入至少一个工作介质流经的放电空间(17),并进一步包括等离子体,其中谐振电路(15)设有至少一个调节电磁场和有功功率的空间分布的元件(18)流动密度,其布置在至少一个等离子喷嘴(1)上。

著录项

  • 公开/公告号WO2018108191A1

    专利类型

  • 公开/公告日2018-06-21

    原文格式PDF

  • 申请/专利权人 MASARYKOVA UNIVERZITA;

    申请/专利号WO2017CZ50060

  • 发明设计人 KLIMA MILOS;

    申请日2017-12-11

  • 分类号H05H1/30;H05H1/46;H05H1/54;

  • 国家 WO

  • 入库时间 2022-08-21 12:43:49

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