首页> 外国专利> METHOD FOR MANUFACTURING ILLUMINANCE ADJUSTMENT FILTER, ILLUMINANCE ADJUSTMENT FILTER, LIGHTING OPTICAL SYSTEM, AND EXPOSURE DEVICE

METHOD FOR MANUFACTURING ILLUMINANCE ADJUSTMENT FILTER, ILLUMINANCE ADJUSTMENT FILTER, LIGHTING OPTICAL SYSTEM, AND EXPOSURE DEVICE

机译:制造照明调节滤光片,照明调节滤光片,照明光学系统和曝光设备的方法

摘要

This method for manufacturing an illuminance adjustment filter comprises steps of: measuring illuminance I(i) at an arbitrary point i (i is an integer) on an exposure surface with no optical filter (90) placed in an optical path EL; calculating the optical transmittance distribution for each cell (91) on the basis of the measured illuminance I(i) at each point; and forming an optical filter (90) including cells (91) each having a pattern (93) corresponding to the calculated optical transmittance distribution. Thus, any variation in the illuminance distribution on the exposure surface caused by components constituting a lighting optical system is minimized.
机译:该照度调节滤光器的制造方法包括以下步骤:在没有将滤光器(90)放置在光路EL中的情况下,测量曝光面上的任意点i(i为整数)的照度I(i)。根据测得的每个点的照度I(i),计算每个单元(91)的透光率分布;形成包括单元(91)的滤光器(90),每个单元具有对应于计算的光透射率分布的图案(93)。因此,由构成照明光学系统的部件引起的曝光表面上的照度分布的任何变化被最小化。

著录项

  • 公开/公告号WO2018003418A1

    专利类型

  • 公开/公告日2018-01-04

    原文格式PDF

  • 申请/专利权人 V TECHNOLOGY CO. LTD.;

    申请/专利号WO2017JP20885

  • 发明设计人 KAWASHIMA HIRONORI;

    申请日2017-06-05

  • 分类号G03F7/20;G02B21/06;

  • 国家 WO

  • 入库时间 2022-08-21 12:46:32

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