首页> 外国专利> equipment and systems for incision of nano structures on lacquers and inks coated on plastic films or membranes or any surface that can be coated with these lacquers and inchiostand polimerizzano under exposure to ultraviolet light.these lacquers and inks reproduce on their surface diffraction lattices, holograms, microlenti, interference filters, and photonic crystals.

equipment and systems for incision of nano structures on lacquers and inks coated on plastic films or membranes or any surface that can be coated with these lacquers and inchiostand polimerizzano under exposure to ultraviolet light.these lacquers and inks reproduce on their surface diffraction lattices, holograms, microlenti, interference filters, and photonic crystals.

机译:用于在漆膜上切割纳米结构的设备和系统,以及在塑料膜或薄膜上或暴露于紫外线的情况下,可以在这些表面上涂覆的漆和墨的任何表面,这些漆和墨会在其表面重现衍射晶格,全息图,微透镜,干涉滤光片和光子晶体。

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