AG ALLOY FILM FOR REFLECTING ELECTRODE OR WIRING ELECTRODE, REFLECTING ELECTRODE OR WIRING ELECTRODE, AND AG ALLOY SPUTTERING TARGET

• 1. 反射电极用或布线电极用Ag合金膜、反射电极或布线电极、和Ag合金溅射靶 [P] . 中国专利： CN105324510B . 2018.12.14
• 2. 反射电极用或布线电极用Ag合金膜、反射电极或布线电极、和Ag合金溅射靶 [P] . 中国专利： CN105324510A . 2016-02-10
• 3. Ag Ag AG ALLOY FILM FOR REFLECTING ELECTRODE OR WIRING ELECTRODE REFLECTING ELECTRODE OR WIRING ELECTRODE AND AG ALLOY SPUTTERING TARGET [P] . 韩国专利： KR101764053B1 . 2017-08-01

  机译： Ag Ag AG反射膜或反射线的合金膜，反射电极或配线的反射膜和AG合金溅射靶

• 4. Ag alloy film for reflecting electrode or wiring electrode, reflecting electrode or wiring electrode, and Ag alloy sputtering target [P] . 美国专利： US9947429B2 . 2018-04-17

  机译： 用于反射电极或配线电极的Ag合金膜，反射电极或配线电极以及Ag合金溅射靶

• 5. AG ALLOY FILM FOR REFLECTING ELECTRODE OR WIRING ELECTRODE, REFLECTING ELECTRODE OR WIRING ELECTRODE, AND AG ALLOY SPUTTERING TARGET [P] . 韩国专利： KR20160013102A . 2016-02-03

  机译： 用于反射电极或接线电极，反射电极或接线电极的AG合金膜以及AG合金溅射靶

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• 2. Photo-Corrosion of CdSe Film Electrode by Electrochemical Modulation Reflectance Spectrum [J] . 单忠强, 田建华, 刘义平, 天津大学学报（英文版） . 2004,第004期
• 3. Structure and electrochemical hydrogen storage characteristics of La0.8-xPrxMg0.2Ni3.15Co0.2A10.1Si0.05 (x=0-0.4) electrode alloys [J] . ZHANG Yang-huan, HOU Zhong-hui, YANG Tai, 中南大学学报（英文版） . 2013,第005期
• 4. Electrode properties and phase composition of Ti0.5Ni0.25Al0.25 hydrogen storage alloys and theoretical simulation [J] . WU Jun, XU Yan-hui, CHEN Chang-pin, 中国有色金属学报（英文版） . 2010,第010期
• 5. Lower Resistivity Wiring Process for TFT Source/Drain Electrodes by Oxygen-mixture Sputtering of Cu-Ca Alloy [J] . Satoru Takasawa, Satoru Ishibashi, Tadashi Masuda SID International Symposium: Digest of Technology Papers . 2009,第3期
• 6. Effect of positively charged particles on sputtering damage of organic electro-luminescent diodes with Mg:Ag alloy electrodes fabricated by facing target sputtering [J] . Kouji Suemori, Satoshi Hoshino, Nobuki Ibaraki, AIP Advances . 2017,第4期
• 7. Influence of magnetron sputtering deposition conditions and thermal treatment on properties of platinum thin films for positive electrode-electrolyte-negative electrode structure [J] . Sakaliuniene Jolita, Abakeviciene Brigita, Slapikas Kestutis, Thin Solid Films . 2015,第NOVa2PTaA期
• 8. EFFECTS OF ELECTRODE DISTANCE AND TARGET ANGLES ON ELEMENTAL CONCENTRATIONS AND FILM PROPERTIES OF AL-DOPED ZNO FILMS PREPARED BY MAGNETRON CO-SPUTTERING [C] . Angelika Gorgulla, Kay Hagedorn, Giso Hahn, European Photovoltaic Solar Energy Conference and Exhibition . 2015
• 9. Characterization of charge injection processes of thin films on indium tin oxide electrodes using a novel spectroelectrochemical technique: Potential-modulated attenuated total reflectance spectroscopy. [D] . Araci, Zeynep Ozkan. 2010
• 10. Influence of Oxygen Concentration on the Performance of Ultra-Thin RF Magnetron Sputter Deposited Indium Tin Oxide Films as a Top Electrode for Photovoltaic Devices [O] . Jephias Gwamuri, Murugesan Marikkannan, Jeyanthinath Mayandi, 2016
• 11. Effect of positively charged particles on sputtering damage of organic electro-luminescent diodes with Mg:Ag alloy electrodes fabricated by facing target sputtering [O] . Kouji Suemori, Satoshi Hoshino, Nobuki Ibaraki, 2017
• 12. Chemically Modified Electrodes. XIV. Attachment of Reagents to Oxide-Free Glassy Carbon Surfaces. Electroactive RF Polymer Films on Carbon and Platinum Electrodes. [R] . nowak, r. schultz, f. a. 1978

• 1. Structure and electrochemical hydrogen storage characteristics of Lao.8-xPrxMg0.2Ni3.15CO 0.2Al0.1Si0.05 （x=0-0.4） electrode alloys [J] . 张羊换 ,侯忠辉 ,杨泰 . 中南大学学报 . 2013,第005期
• 2. 马来酸在表面合金电极上还原过程的离子色谱和原位红外反射光谱研究 [C] . 陈声培 ,黄桃 ,侯晓雯 . 第十三届全国分子光谱学学术会议 . 2004
• 3. Ag-Ti合金电极和LSMO功能层对Metal/Pr0.7Ca0.3MnO3/Pt异质结电致电阻转变特性的影响 [A] . 王仲伟 . 2011