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X-ray analysis method for surface coated fine particles and X-ray analysis apparatus for surface coated fine particles

机译:表面被覆微粒的X射线分析方法及表面被覆微粒的X射线分析装置

摘要

PROBLEM TO BE SOLVED: To provide an X-ray analysis method for surface-coated microparticles capable of simply evaluating the film thickness and irregularity of a surface-coated film layer of a microparticle.SOLUTION: The X-ray analysis method for surface-coated microparticles includes processing of: applying an X-ray to a microparticle S with a coated film layer Sx including an element different from a parent phase Sy on the surface; measuring a first amperage Idependent on X-ray absorption by a first element A provided in the coated film layer Sx; measuring a second amperage Idependent on X-ray absorption by a second element B provided in the parent layer Sy; calculating a film thickness d of the coated film layer Sx from a magnitude of a change in the first amperage Irepresenting a change in an X-ray absorption amount near an X-ray absorption end of the first element A; and calculating at least one of a size of the irregularity of the coated film layer Sx and a coating rate from the magnitude of the change in the second amperage Irepresenting the change in an X-ray absorption amount near an X-ray absorption end of the second element B, and the film thickness d.SELECTED DRAWING: Figure 7
机译:解决的问题:提供一种能够简单评估微粒的表面涂层薄膜层的膜厚和不规则性的表面涂层微粒的X射线分析方法。解决方案:表面涂层的X射线分析方法微粒包括以下处理:对具有被覆膜层Sx的微粒S施加X射线,该被覆膜层Sx在表面上包含与母相Sy不同的元素。通过设置在涂膜层Sx中的第一元素A测量取决于X射线吸收的第一安培数;通过设置在母体层Sy中的第二元素B测量取决于X射线吸收的第二安培数;根据代表第一元件A的X射线吸收端附近的X射线吸收量的变化的第一安培数的变化量I,计算涂膜层Sx的膜厚d。并且,根据第二安培数的变化量,算出涂膜层Sx的凹凸的大小和覆盖率中的至少之一,该第二安培数的变化表示在X射线吸收端附近的X射线吸收量的变化。第二个元素B和薄膜厚度d。选择的图纸:图7

著录项

  • 公开/公告号JP6358045B2

    专利类型

  • 公开/公告日2018-07-18

    原文格式PDF

  • 申请/专利权人 富士通株式会社;

    申请/专利号JP20140223159

  • 发明设计人 土井 修一;

    申请日2014-10-31

  • 分类号G01B15/02;G01N23/227;G01B15/08;

  • 国家 JP

  • 入库时间 2022-08-21 13:10:18

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