首页> 外国专利> METHOD AND SYSTEM FOR GROWING PLANTS USING SILICATE-BASED SUBSTRATE, CULTIVATION OF ENHANCED PHOTOSYNTHETIC PRODUCTIVITY AND PHOTOSAFENING BY UTILIZATION OF EXOGENOUS GLYCOPYRANOSIDES FOR ENDOGENOUS GLYCOPYRANOSYL-PROTEIN DERIVATIVES, AND FORMULATIONS, PROCESSES AND SYSTEMS FOR THE SAME

METHOD AND SYSTEM FOR GROWING PLANTS USING SILICATE-BASED SUBSTRATE, CULTIVATION OF ENHANCED PHOTOSYNTHETIC PRODUCTIVITY AND PHOTOSAFENING BY UTILIZATION OF EXOGENOUS GLYCOPYRANOSIDES FOR ENDOGENOUS GLYCOPYRANOSYL-PROTEIN DERIVATIVES, AND FORMULATIONS, PROCESSES AND SYSTEMS FOR THE SAME

机译：利用硅酸盐基基质生长植物的方法和系统，通过利用外源糖苷（用于内源糖基-糖基蛋白衍生物），方法和系统来提高光合作用的生产力和光合作用的方法和系统

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摘要

PROBLEM TO BE SOLVED: To provide a method for promoting plant growth based on novel photosafening treatment regimes.SOLUTION: There is provided a method for promoting plant growth based on novel photosafening treatment regimes with glycopyranosides including glycopyranosylglycopyranosides, and aryl-α-D-glycopyranosides, and more specifically, with one or more compounds comprising terminal mannosyl-triose, optionally in the presence of light enhanced by one or more light reflecting and/or refracting members such as silicon-based substrates. According to the present invention, furthermore, there is also provided a chemical synthesis process for the compound for general application to plants. Silicate microbeads of the like are distributed over the ground or substrate in which roots of a plant are supported and planted, beneath and around a plant in a manner that light is refracted or reflected toward the phylloplane.SELECTED DRAWING: Figure 1

机译：解决的问题：提供一种基于新型光增效处理方案促进植物生长的方法解决方案：提供一种基于新型光增效处理方案利用糖吡喃糖苷（包括吡喃糖基糖基吡喃糖苷和芳基-α-D-吡喃糖苷）促进植物生长的方法更具体地讲，与一种或多种包含末端甘露糖基三糖的化合物一起，任选地在由一种或多种光反射和/或折射构件例如硅基基底增强的光的存在下。此外，根据本发明，还提供了该化合物的化学合成方法，该化合物可普遍应用于植物。诸如此类的硅酸盐微珠分布在地面或基质上，植物的根部被支撑并种植在其中，并在植物的下方和周围以光向叶面的折射或反射的方式进行选择。图1

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公开/公告号JP2017205122A

专利类型
公开/公告日2017-11-24

原文格式PDF
申请/专利权人 INNOVATION HAMMER LLC;
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申请/专利号JP20170136563
发明设计人 ARTHUR M NONOMURA;
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申请日2017-07-12
分类号A01G7;A01G7/06;A01G9/02;A01N43/16;A01P21;
国家 JP
入库时间 2022-08-21 13:12:01

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