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Increasing the doping efficiency during proton irradiation
Increasing the doping efficiency during proton irradiation
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机译:在质子辐照过程中提高掺杂效率
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摘要
A description is given of a method for doping a semiconductor body, and a semiconductor body produced by such a method. The method comprises irradiating the semiconductor body with protons and irradiating the semiconductor body with electrons. After the process of irradiating with protons and after the process of irradiating with electrons, the semiconductor body is subjected to heat treatment in order to attach the protons to vacancies by means of diffusion.
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