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Increasing the doping efficiency during proton irradiation

机译:在质子辐照过程中提高掺杂效率

摘要

A description is given of a method for doping a semiconductor body, and a semiconductor body produced by such a method. The method comprises irradiating the semiconductor body with protons and irradiating the semiconductor body with electrons. After the process of irradiating with protons and after the process of irradiating with electrons, the semiconductor body is subjected to heat treatment in order to attach the protons to vacancies by means of diffusion.
机译:对掺杂半导体本体的方法以及通过这种方法制造的半导体本体进行描述。该方法包括用质子照射半导体本体并且用电子照射半导体本体。在质子辐照之后和电子辐照之后,对半导体本体进行热处理,以通过扩散使质子附着在空位上。

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