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Underpotential deposition-mediated layer-by-layer growth of thin films

机译：欠电位沉积介导的薄膜逐层生长

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摘要

A method of depositing contiguous, conformal submonolayer-to-multilayer thin films with atomic-level control is described. The process involves electrochemically exchanging a mediating element on a substrate with a noble metal film by alternatingly sweeping potential in forward and reverse directions for a predetermined number of times in an electrochemical cell. By cycling the applied voltage between the bulk deposition potential for the mediating element and the material to be deposited, repeated desorption/adsorption of the mediating element during each potential cycle can be used to precisely control film growth on a layer-by-layer basis.

机译：描述了一种通过原子级控制来沉积连续的，保形的亚单层至多层薄膜的方法。该方法涉及通过在电化学电池中在正反方向上交替扫动电势预定次数来用贵金属膜对基板上的介电元素进行电化学交换。通过使施加的电压在介电元件的整体沉积电势与待沉积的材料之间循环，可以在每个电势循环期间对介电元件进行反复的解吸/吸附，以逐层精确地控制薄膜的生长。

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公开/公告号US9689085B2

专利类型
公开/公告日2017-06-27

原文格式PDF
申请/专利权人 BROOKHAVEN SCIENCE ASSOCIATES LLC;
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申请/专利号US201514689708
发明设计人 JIA XU WANG;RADOSLAV R. ADZIC;
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申请日2015-04-17
分类号C25D5/18;C25D21/12;B01J21/18;B01J23/42;B01J23/44;B01J37/02;B01J37/34;C25D5/34;H01M4/86;H01M4/88;H01M4/92;C25D7;C25D3/50;
国家 US
入库时间 2022-08-21 13:43:48

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