首页> 外国专利> HIGH POLYMERIC MATERIAL FOR SELF ORGANIZATION, SELF ORGANIZATION FILM, MANUFACTURING METHOD OF SELF ORGANIZATION FILM, PATTERN AND FORMING METHOD OF PATTERN

HIGH POLYMERIC MATERIAL FOR SELF ORGANIZATION, SELF ORGANIZATION FILM, MANUFACTURING METHOD OF SELF ORGANIZATION FILM, PATTERN AND FORMING METHOD OF PATTERN

机译:用于自组织的高聚物材料,自组织膜,自组织膜的制造方法,图案和图案的形成方法

摘要

PROBLEM TO BE SOLVED: To provide a high polymeric material for self-organization capable of reducing defects based on a micro phase separation defective part and further forming a fine and small repeated pattern, a self-organization film, a manufacturing method of the self-organization film, a pattern and a forming method of the pattern.SOLUTION: The high polymeric material for self-organization contains a multi block copolymer by connecting a first polymer block mainly containing a constitutional unit having a specific structure and a second polymer block mainly containing a constitutional unit having a specific structure.SELECTED DRAWING: None
机译:解决的问题:提供一种用于自组织的高分子材料,其能够减少基于微相分离缺陷部分的缺陷并进一步形成精细和小的重复图案,自组织膜,自组织的制造方法。解决方案:用于自组织的高分子材料通过连接主要包含具有特定结构的结构单元的第一聚合物嵌段和主要包含特定结构单元的第二聚合物嵌段而包含多嵌段共聚物。具有特定结构的组成单元。

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