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PLASMA IMPEDANCE MATCHING UNIT, SYSTEM FOR SUPPLYING RF POWER TO A PLASMA LOAD, AND METHOD OF SUPPLYING RF POWER TO A PLASMA LOAD
PLASMA IMPEDANCE MATCHING UNIT, SYSTEM FOR SUPPLYING RF POWER TO A PLASMA LOAD, AND METHOD OF SUPPLYING RF POWER TO A PLASMA LOAD
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机译：等离子体阻抗匹配单元，向等离子体负载供应射频功率的系统以及向等离子体负载供应射频功率的方法
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摘要
A plasma impedance matching unit (13) for a plasma power supply system (10, 100) comprises a. a first power connector (40) for coupling the matching unit (13) to a power source (11), b. a second power connector (41) for coupling the matching unit (13) to a plasma load (20), c. a data link interface (45) for directly coupling the impedance matching unit (13) to another plasma impedance matching unit (14) of the plasma power supply system (10, 100) via a data link (48), d. a controller (42) configured to control the matching unit (13) in order to match the impedance from the first power connector (40) to the impedance at the second power connector (41), wherein e. the controller (42) is configured to operate as a master for at least one other impedance matching unit (14) and/or at least one RF power source (11, 12) of the plasma power supply system (10, 100), wherein the controller (42) communicates via the data link interface (45) with the other impedance matching unit(s) (14) and/or RF power source(s) (11, 12) of the plasma power supply system (10, 100).
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