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ACIDIC TEXTURING SOLUTION FOR ETCHING SOLAR CELL SILICON WAFER, TEXTURING METHOD, SOLAR CELL AND MANUFACTURING METHOD FOR SOLAR CELL
ACIDIC TEXTURING SOLUTION FOR ETCHING SOLAR CELL SILICON WAFER, TEXTURING METHOD, SOLAR CELL AND MANUFACTURING METHOD FOR SOLAR CELL
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机译：用于蚀刻太阳能电池硅晶片的酸性加弹解决方案，加弹方法，太阳能电池和太阳能电池的制造方法
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摘要
An acidic texturing solution for etching a solar cell silicon wafer, a texturing method, a solar cell and a manufacturing method for the solar cell. The acidic texturing solution comprises a copper ion source for providing copper ions with a concentration of 0.1-25 mmol/L, a fluorine ion source for providing fluorine ions with a concentration of 0.5-10 mol/L, and an oxidant with a concentration of 0.1-1.0 mol/L that is capable of oxidizing copper into the copper ions. The surface of the silicon wafer can be textured well by means of the acidic texturing solution and thus an independent, complete and compactly arranged micron-size inverted pyramid-shaped structure is formed on the surface of the silicon wafer at relatively low temperature and in relatively short time. By using the inverted pyramid-shaped structure, the reflectivity of incident light on the textured surface is reduced to 5%-15% so that the efficiency of the solar cell is improved. The inverted pyramid-shaped structure is not limited to the preparation of an HIT and a conventional diffusion cell and can be also applied in other solar cells and optoelectronic devices using a silicon substrate.
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