Atomic Layer Deposition (ALD) of TiO2 using (Tetrakis(dimethylamino)titanium) TDMAT as an Encapsulation and/or Barrier Layer for ALD PbS

• 1. 用于原子层沉积(ALD)和化学气相沉积(CVD)的前体化合物以及使用其的ALD/CVD工艺 [P] . 中国专利： CN112020504A . 2020-12-01
• 2. 使用原子层沉积(ALD)法在基底上形成含钛层的方法 [P] . 中国专利： CN101959897A . 2011-01-26
• 3. Reactor for the deposition of atomic layer (ald), an application for the encapsulation of an oled apparatus by deposition of transparent layer of al2o3. [P] . 法国专利： FR2989691B1 . 2014-05-23

  机译： 用于沉积原子层的反应器（醛），用于通过沉积透明的Al2O3层来封装含油设备的应用。

• 4. REACTOR FOR ATOMIC LAYER DEPOSITION (ALD), APPLICATION TO ENCAPSULATING AN OLED DEVICE BY TRANSPARENT AL2O3 LAYER DEPOSITION. [P] . 法国专利： FR2989691A1 . 2013-10-25

  机译： 原子层沉积反应堆（ALD），用于通过透明的Al2O3层沉积实现OLED器件。

• 5. Reactor for atomic layer deposition (ALD), use for encapsulating an OLED device by depositing a transparent layer of Al2O3 [P] . 欧洲知识产权局专利： EP2657364A1 . 2013-10-30

  机译： 原子层沉积反应器（ALD），用于通过沉积Al2O3透明层来封装OLED器件

• 1. Atomic layer deposition of ultrathin layered TiO2 on Pt/C cathode catalyst for extended durability in polymer electrolyte fuel cells [J] . Sangho Chung, Myounghoon Choun, Beomgyun Jeong, 能源化学：英文版 . 2016,第002期
• 2. DBD plasma assisted atomic layer deposition alumina barrier layer on self-degradation polylactic acid film surface [J] . 等离子体科学和技术（英文版） . 2019,第001期
• 3. Atomic-Scale Layer-by-Layer Deposition of Fe SiAl@ZnO@Al_(2)O_(3) Hybrid with Threshold Anti-Corrosion and Ultra-High Microwave Absorption Properties in Low-Frequency Bands [J] . Wei Tian, Jinyao Li, Yifan Liu, 纳微快报：英文版 . 2021,第010期
• 4. Dataset for TiN Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium (TDMAT) and Titanium Tetrachloride (TiCl 4) Precursor [J] . Woo-Jae Lee, Eun-Young Yun, Han-Bo-Ram Lee, Data in Brief . 2020,第3期
• 5. Data set for fabrication of conformal two-dimensional TiO2 by atomic layer deposition using tetrakis (dimethylamino) titanium (TDMAT) and H2O precursors [J] . Serge Zhuiykov, Mohammad Karbalaei Akbari, Zhenyin Hai, Data in Brief . 2017,第1期
• 6. Wafer-scale fabrication of conformal atomic-layered TiO_2 by atomic layer deposition using tetrakis (dimethylamino) titanium and H_2O precursors [J] . Zhuiykov Serge, Akbari Mohammad Karbalaei, Hai Zhenyin, Materials & design . 2017,第APRa期
• 7. Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) for Barrier Coatings on Polymers [C] . D. S. Seghete, S. H. Jen, J. A. Bertrand, IMAPS/ACerS International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies . 2009
• 8. Elimination of CO Poison Effect Via Au Nanoparticles (NPs)/Ultrathin Tio2 Fabricated by Atomic Layer Deposition (ALD) in Proton Exchange Membrane Fuel Cells (PEMFCs) [D] . Yang, Yuanxi. 2018
• 9. Data set for fabrication of conformal two-dimensional TiO2 by atomic layer deposition using tetrakis (dimethylamino) titanium (TDMAT) and H2O precursors [O] . Serge Zhuiykov, Mohammad Karbalaei Akbari, Zhenyin Hai, 2017
• 10. Dataset for TiN Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium (TDMAT) and Titanium Tetrachloride (TiCl4) Precursor [O] . Woo-Jae Lee, Eun-Young Yun, Han-Bo-Ram Lee, 2020
• 11. Effect of Atomic Layer Depositions (ALD)-Deposited Titanium Oxide (TiO2) Thickness on the Performance of Zr40Cu35Al15Ni10 (ZCAN)/TiO2/Indium (In)-Based Resistive Random Access Memory (RRAM) Structures. [R] . Chin, M. L., Amani, M., O'Regan, T. P., 2015

• 1. Plasma-Assisted ALD of an Al_2O_3 Permeation Barrier Layer on Plastic [J] . 雷雯雯 ,李兴存 ,陈强 . 等离子体科学与技术：英文版 . 2012,第2期
• 2. Characterization of Cd1-xZnxTe (0≤x≤1) Nanolayers Grown by Atomic Layer Deposition on GaSb and GaAs (001) Oriented Substrates [J] . Joel Díaz-Reyes ,Roberto Saúl Castillo-Ojeda ,José Eladio Flores-Mena . 电子科技学刊 . 2019,第002期
• 3. 原子层沉积(ALD)系统的研究 [C] . 叶位彬 ,黄光周 ,朱建明 . 2009年薄膜技术高峰论坛暨广东省真空学会学术年会 . 2009
• 4. 原子层沉积(ALD)在钙钛矿太阳能电池中的应用 [A] . 高传奇 . 2019