首页> 外国专利> Process and system for calibrating a first loop feature value estimation method using a first locally measurable loop characteristic and a first set of parameters

Process and system for calibrating a first loop feature value estimation method using a first locally measurable loop characteristic and a first set of parameters

机译:使用第一局部可测量的回路特性和第一组参数来校准第一回路特征值估计方法的过程和系统

摘要

A process for calibrating a first loop feature value estimation method using a first locally measurable loop characteristic and a first set of parameters, includes taking measurements of the first locally measurable loop characteristic for a plurality of loops, and obtaining a reference data set representing reference estimates of the loop feature value. The reference estimates are obtained by performing a calibrated second loop feature value estimation method using a second locally measurable loop characteristic and a second set of parameters. The method further includes determining calibrated parameters so as to minimize a deviation between the reference estimates and estimates obtained by applying the first estimation method to the measurements using the calibrated parameters as the first set of parameters.
机译:一种使用第一局部可测量回路特性和第一组参数来校准第一回路特征值估计方法的过程,包括对多个回路进行第一局部可测量回路特性的测量,并获得表示参考估计的参考数据集循环特征值。通过使用第二局部可测量回路特性和第二组参数执行校准的第二回路特征值估算方法来获得参考估算。该方法还包括确定校准参数,以便最小化参考估计和通过将第一估计方法作为校准参数用作第一组参数将第一估计方法应用于测量结果而获得的估计之间的偏差。

著录项

  • 公开/公告号US9316715B2

    专利类型

  • 公开/公告日2016-04-19

    原文格式PDF

  • 申请/专利权人 NICOLAS DUPUIS;BENOIT DROOGHAAG;

    申请/专利号US201113995303

  • 发明设计人 BENOIT DROOGHAAG;NICOLAS DUPUIS;

    申请日2011-12-21

  • 分类号G01R35/00;H04B3/466;

  • 国家 US

  • 入库时间 2022-08-21 14:31:58

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