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In-situ Combined Sensing of Uniaxial Nanomechanical and Micromechanical Stress with Simultaneous Measurement of Surface Temperature Profiles by Raman Shift in Nanoscale and Microscale Structures
In-situ Combined Sensing of Uniaxial Nanomechanical and Micromechanical Stress with Simultaneous Measurement of Surface Temperature Profiles by Raman Shift in Nanoscale and Microscale Structures
Embodiments of the present disclosure include separating a measured Raman shift signal into mechanical and thermal components when a uniaxial compressive load is applied in situ. In some embodiments, in situ uniaxial compressive loads are applied on examined specimens from room temperature to 150° C. In alternate embodiments, Raman shift measurements are performed as a function of strain at constant temperature and/or as a function of temperature at constant strain levels. It was realized that the Raman shift measured at a given temperature under a given level of applied stress can be expressed as a summation of stress-induced Raman shift signal and temperature-induced Raman shift signal measured separately. Such a separation of Raman shift signal is utilized by various embodiments to measure localized change in thermal conductivity and/or mechanical stress of structures (e.g., semiconductor structures) under applied stress.
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