首页> 外国专利> Defect analyzer substrate, the substrate processing system, defect analysis method for a substrate, a program and a computer storage medium

Defect analyzer substrate, the substrate processing system, defect analysis method for a substrate, a program and a computer storage medium

机译:缺陷分析仪基板,基板处理系统,基板的缺陷分析方法,程序和计算机存储介质

摘要

PROBLEM TO BE SOLVED: To prevent potential trouble by analyzing defects of a wafer.SOLUTION: There is provided a device for analyzing defects of a substrate, the device including an imaging device that photographs a substrate to be inspected, a defect feature amount extraction unit that extracts the feature amount of defects in the surface of the substrate on the basis of the photographed image of the substrate, a defect feature amount integration unit that integrates the feature amounts of the defects of a plurality of substrates to create integrated data AH, a defect determination unit that determines whether or not the integrated feature amounts of the defects exceed a predetermined threshold, and an output unit that outputs a result of the determination by the defect determination unit.
机译:解决的问题:为了通过分析晶片的缺陷来防止潜在的麻烦。解决方案:提供了一种用于分析基板的缺陷的装置,该装置包括拍摄要检查的基板的成像装置,缺陷特征量提取单元。缺陷特征量积分单元,其基于基板的拍摄图像提取基板表面中的缺陷的特征量;缺陷特征量积分单元,其对多个基板的缺陷的特征量进行积分以产生积分数据AH,缺陷确定单元确定缺陷的积分特征量是否超过预定阈值,输出单元输出缺陷确定单元的确定结果。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号