首页> 外国专利> INFRARED THERMOGRAPH RESOLUTION EVALUATION PATTERN AND INFRARED THERMOGRAPH RESOLUTION EVALUATION METHOD

INFRARED THERMOGRAPH RESOLUTION EVALUATION PATTERN AND INFRARED THERMOGRAPH RESOLUTION EVALUATION METHOD

机译:红外热成像分辨率评估方法和红外热成像分辨率评估方法

摘要

PROBLEM TO BE SOLVED: To provide a technique which allows easy grasping of the resolution of an infrared thermograph between regions with different infrared emissivities.SOLUTION: There is provided an infrared thermograph resolution measuring pattern including a first region and a second region on substantially the same surface, the first and second regions each having a first base unit and a second base unit. The first base unit is made of a first material with a first infrared emissivity while the second base unit is made of a second material with a second infrared emissivity, the first and second infrared emissivities being different. The area ratio between the first and second base units is set to be a first area ratio in the first region and be a second area region in the second region, the first and second area ratios being different.SELECTED DRAWING: Figure 4
机译:解决的问题:提供一种能够容易地掌握具有不同红外发射率的区域之间的红外热像仪分辨率的技术。解决方案:提供了一种红外热像仪分辨率测量图案,其包括基本上相同的第一区域和第二区域。在第一表面和第二表面上,第一和第二区域分别具有第一基本单元和第二基本单元。第一基本单元由具有第一红外发射率的第一材料制成,而第二基本单元由具有第二红外发射率的第二材料制成,第一和第二红外发射率不同。第一和第二基本单元之间的面积比设置为在第一区域中的第一面积比和在第二区域中的第二面积区域,第一和第二面积比是不同的。

著录项

  • 公开/公告号JP2016173353A

    专利类型

  • 公开/公告日2016-09-29

    原文格式PDF

  • 申请/专利权人 KOA CORP;

    申请/专利号JP20150076804

  • 发明设计人 OGUCHI TOMONORI;HIRASAWA KOICHI;

    申请日2015-04-03

  • 分类号G01J5/00;G01J5/48;

  • 国家 JP

  • 入库时间 2022-08-21 14:45:22

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号