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SHOWERHEAD ELECTRODES AND SHOWERHEAD ELECTRODE ASSEMBLIES HAVING LOW-PARTICLE PERFORMANCE FOR SEMICONDUCTOR MATERIAL PROCESSING APPARATUSES
SHOWERHEAD ELECTRODES AND SHOWERHEAD ELECTRODE ASSEMBLIES HAVING LOW-PARTICLE PERFORMANCE FOR SEMICONDUCTOR MATERIAL PROCESSING APPARATUSES
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机译:半导体材料加工装置的雾化性能较低的喷头电极和喷头电极组件
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摘要
The showerhead electrode materials for semiconductor processing equipment are provided. One embodiment of the showerhead electrode comprises a top electrode and a bottom electrode bonded to each other. The upper electrode comprises at least one plenum. The bottom electrode comprises a plurality of gas holes and a plasma exposed bottom surface in communication with the fluid plenum. The showerhead electrode assembly comprising a showerhead electrode flexibly mounted on a top board is also disclosed. The showerhead electrode assembly is in fluid communication with the temperature control elements spatially separated from the showerhead electrode can be a showerhead electrode temperature control. The showerhead electrode assembly is a method for processing a substrate in the plasma processing chamber is also disclosed, including. ; The showerhead electrode, a semiconductor material, plenums, gas holes
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