首页> 外国专利> Pulsed laser deposition apparatus with separated target and deposition method for multilayer thin film using of the same

Pulsed laser deposition apparatus with separated target and deposition method for multilayer thin film using of the same

机译:具有分离靶材的脉冲激光沉积装置以及使用该装置的多层薄膜的沉积方法

摘要

The present invention relates to a pulsed laser deposition apparatus, the substrate and the deposited material is located a chamber, located within the chamber, the deposition material, and by supporting the target and by irradiating the laser to the target portion to rotate decomposing the deposited material, a laser generator for depositing a thin film on the substrate from the deposited material decomposition includes, but not the target is the deposited material two or more, and having a physical block according to the deposition surface materials, and characterized in that the laser deposited material has been replaced, the irradiation with the rotation of the target, according to the present invention it can do so only by a simple operation precisely implement the ultra-thin multi-layer structure of a certain period, as well as how to apply them is very simple. ;
机译:脉冲激光沉积设备技术领域本发明涉及一种脉冲激光沉积设备,衬底和沉积材料位于腔室中,位于腔室内,沉积材料并通过支撑靶材并通过将激光照射至靶材部分以旋转而分解沉积物材料,用于从沉积的材料分解而在基板上沉积薄膜的激光发生器包括但不限于两种或两种以上的沉积材料,并且根据沉积的表面材料具有物理阻挡,其特征在于激光根据本发明,仅通过简单的操作就可以精确地实现一定时间段的超薄多层结构,以及如何应用,从而使沉积的材料已经被替换,随目标的旋转进行辐照。他们很简单。 ;

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