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DESIGN RULE GENERATING APPARATUS AND METHOD USING LITHOGRAPHY SIMULATION
DESIGN RULE GENERATING APPARATUS AND METHOD USING LITHOGRAPHY SIMULATION
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机译:设计规则生成装置和使用光刻技术的方法
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摘要
Provided are a design rule generating apparatus and method using a lithography simulation. The design rule generating method includes the steps of: receiving a test pattern; providing a plurality of work flows which correspond to the test pattern and are previously set with regard to a method for generating a mask and a lithography model; and simulating the test pattern according to the work flow selected among the work flows.
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