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AN EDGE-BASED FULL CHIP MASK TOPOGRAPHY MODELING
AN EDGE-BASED FULL CHIP MASK TOPOGRAPHY MODELING
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机译:基于边缘的全芯片面层析成像建模
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摘要
A method and apparatus of a novel full chip edge-based mask three-dimensional (3D) model for performing photolithography simulation is described. The method applies a thin mask model to a mask design layout to create a thin mask transmission. The method generates a thick mask model that has a plurality of edge-based kernels. The method applies the thick mask model to the mask design layout to create a mask 3D residual. The method combines the thin mask transmission and the mask 3D residual to create a mask 3D transmission.
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