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Device for treating materials, especially fermentation residues and mixtures of fermentation residues
Device for treating materials, especially fermentation residues and mixtures of fermentation residues
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机译：用于处理材料的装置，特别是发酵残留物和发酵残留物的混合物
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摘要
The device for the treatment of fermentation residue (2) or fermentation residue mixture, comprises a base (3) for the deposition of the fermentation residue. The base is formed in gas-permeable manner and has an inlet device for supplying a gaseous medium in the base, mounting to a line (6). The parts of the areas of the base flow through from the gaseous medium for aerating the fermentation residue. A heating element is arranged in the area of the base. The base is a part of a container for the reception of the fermentation residue or fermentation residue mixture. The device for the treatment of fermentation residue (2) or fermentation residue mixture, comprises a base (3) for the deposition of the fermentation residue. The base is formed in gas-permeable manner and has an inlet device for supplying a gaseous medium in the base, mounting to a line (6). The parts of the areas of the base flow through from the gaseous medium for aerating the fermentation residue. A heating element is arranged in the area of the base. The base is a part of a container for the reception of the fermentation residue or fermentation residue mixture. The container has an outlet device for discharging the gaseous medium present in the container. The device for supplying a gaseous medium is connected with a line. The outlet device and the inlet device are connected to each other for recycling the gaseous medium over the line. The line is turned so that it is fed alternatively or supplementary to the gaseous medium coming from the outlet device, from external of the container with fresh air. The heating device for heating the gaseous medium flowing through the line is arranged in the line. An independent claim is included for a method for operating a device for the treatment of fermentation residue.
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