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Methods involving pattern matching to identify and resolve potential non-double-patterning-compliant patterns in double patterning applications
Methods involving pattern matching to identify and resolve potential non-double-patterning-compliant patterns in double patterning applications
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机译:涉及模式匹配的方法,用于识别和解析双模式应用程序中潜在的非双模式兼容模式
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摘要
One illustrative method disclosed herein involves producing an initial circuit layout, prior to decomposing the initial circuit layout, identifying at least one potential non-double-patterning-compliant (NDPC) pattern in the initial circuit layout, fixing the at least one potential non-double-patterning-compliant (NDPC) pattern so as to produce a double-patterning-compliant (DPT) pattern, producing a modified circuit layout by removing the potential non-double-patterning-compliant (NDPC) pattern and adding the double-patterning-compliant (DPT) pattern to the initial circuit layout, and performing design rule checking and double patterning compliance checking on the modified circuit layout.
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