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Topological insulator structure having magnetically doped topological insulator quantum well film
Topological insulator structure having magnetically doped topological insulator quantum well film
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机译:具有磁掺杂拓扑绝缘体量子阱膜的拓扑绝缘体结构
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摘要
A topological insulator structure includes an insulating substrate and a magnetically doped TI quantum well film located on the insulating substrate. A material of the magnetically doped TI quantum well film is represented by a chemical formula of Cry(BixSb1-x)2-yTe3. 0x1, 0y2. Values of x and y satisfies that an amount of a hole type charge carriers introduced by a doping with Cr is substantially equal to an amount of an electron type charge carriers introduced by a doping with Bi. The magnetically doped TI quantum well film is in 3 QL to 5 QL.
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机译:拓扑绝缘体结构包括绝缘基板和位于绝缘基板上的磁性掺杂的TI量子阱膜。磁性掺杂TI量子阱膜的材料由Cr y Sub>(Bi x Sub> Sb 1-x Sub>) 2-y Sub> Te 3 Sub>。 0 展开▼