首页> 外国专利> Method and system for manufacturing a target for the emission of photon radiation, particularly X rays, or of particles, particularly protons or electrons, by laser firing

Method and system for manufacturing a target for the emission of photon radiation, particularly X rays, or of particles, particularly protons or electrons, by laser firing

机译:用于制造靶的方法和系统,该靶用于通过激光发射来发射光子辐射,特别是X射线,或者发射粒子,特别是质子或电子。

摘要

A method of manufacturing a target for the generation of radiation of photons, protons or electrons by means of a laser, including: forming a support including first and second surfaces connected by openings, and forming in an enclosure a layer of material on the first surface by protecting the first surface with a protection element, injecting into the enclosure a gas of filling material, adjusting the pressure in the enclosure and the temperature of the support to form plugs of material in the openings of the support, and maintaining the temperature of the support and the pressure in the enclosure at values to maintain the plugs, followed by withdrawing the protection element from the first surface, and forming a layer of metallic material on the first surface of the support and on the plugs. The pressure and support temperature are then modified to remove the plugs.
机译:一种通过激光制造用于产生光子,质子或电子辐射的靶的方法,该方法包括:形成包括通过开口连接的第一和第二表面的支撑体,以及在外壳中在第一表面上形成材料层。通过用保护元件保护第一表面,向外壳中注入填充材料的气体,调节外壳中的压力和支撑件的温度,以在支撑件的开口中形成材料塞,并保持支撑件的温度。支撑件和外壳中的压力保持在一定值以保持塞子,然后从第一表面撤回保护元件,并在支撑件的第一表面和塞子上形成一层金属材料。然后修改压力和支撑温度以移除塞子。

著录项

  • 公开/公告号US9139898B2

    专利类型

  • 公开/公告日2015-09-22

    原文格式PDF

  • 申请/专利号US201414187685

  • 发明设计人 JEAN-PAUL PERIN;

    申请日2014-02-24

  • 分类号C23C14/22;H05G2/00;C23C14/04;C23C14/14;C23C14/50;C23C14/54;H01J35/08;

  • 国家 US

  • 入库时间 2022-08-21 15:20:59

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