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METHODS OF PREPARING LAYOUTS FOR SEMICONDUCTOR DEVICES, PHOTOMASKS FORMED USING THE LAYOUTS, AND SEMICONDUCTOR DEVICES FABRICATED USING THE PHOTOMASKS
METHODS OF PREPARING LAYOUTS FOR SEMICONDUCTOR DEVICES, PHOTOMASKS FORMED USING THE LAYOUTS, AND SEMICONDUCTOR DEVICES FABRICATED USING THE PHOTOMASKS
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机译：为半导体设备准备布局的方法，使用布局形成的照片集以及使用照片集制造的半导体设备的方法
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摘要
Methods of preparing layouts for semiconductor devices and semiconductor devices fabricated using the layouts are provided. Preparing the layouts for semiconductor devices may include disposing assistant patterns near a main gate pattern that is provided on a weak active pattern. The weak active pattern may be, for example, an outermost one of active patterns and may be one expected to have an increased width during a fabrication process.
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