首页> 外国专利> OPTICAL APPARATUSES INCLUDING METAL-ASSISTED CHEMICAL ETCHING METHOD USING VERTICAL NANOWIRES AND THE METHOD FOR MANUFACTURING THE SAME.

OPTICAL APPARATUSES INCLUDING METAL-ASSISTED CHEMICAL ETCHING METHOD USING VERTICAL NANOWIRES AND THE METHOD FOR MANUFACTURING THE SAME.

机译:光学设备包括使用垂直纳米线的金属辅助化学刻蚀方法及其制造方法。

摘要

The present invention relates to a manufacturing method for an optical apparatus, etc. using a vertical nanostructure, which comprises: a step of preparing at least one substrate among a single crystal semiconductor substrate such as Si and Ge, a III-V compound semiconductor substrate such as GaAs and InP, and a silicon on insulator (SOI); a step of patterning a desired vertical nanostructure on the washed substrate using one or more methods between a lithography method and a self-assembly template method; a step of depositing catalyst metal, which includes one among gold, silver, platinum, and two or more combinations thereof, on the upper part of the substrate in a reverse pattern of the vertical nanostructure to be finally completed; and a step of manufacturing the vertical nanostructure using a metal catalyst etching method which is to submerge into a solution where hydrofluoric acid (HF) and hydrogen peroxide (H_2O_2) are mixed. Therefore, the manufacturing method can easily manufacture fine and elaborate patterns by manufacturing a grid structure using the metal catalyst etching method. The optical apparatus with a SWG nanostructure manufactured thereby can provide more effective performance than a structure manufactured by an existing dry etching method.
机译:本发明涉及一种使用垂直纳米结构的光学设备等的制造方法,该方法包括以下步骤:制备单晶半导体衬底中的至少一个衬底,例如Si和Ge,III-V族化合物半导体衬底。如GaAs和InP,以及绝缘体上硅(SOI);使用光刻方法和自组装模板方法之间的一种或多种方法在洗涤过的基板上构图所需的垂直纳米结构的步骤;将包括金,银,铂及其两种以上的组合中的一种的催化剂金属以垂直纳米结构的相反图案沉积在基板的上部上以最终完成的步骤;使用金属催化剂蚀刻方法制造垂直纳米结构的步骤,该方法将浸入混合有氢氟酸(HF)和过氧化氢(H_2O_2)的溶液中。因此,该制造方法可以通过使用金属催化剂蚀刻方法制造栅格结构来容易地制造精细且精细的图案。由此制造的具有SWG纳米结构的光学设备可以提供比通过现有的干蚀刻方法制造的结构更有效的性能。

著录项

  • 公开/公告号KR101438797B1

    专利类型

  • 公开/公告日2014-09-16

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20130015754

  • 发明设计人 이석희;정현호;최지훈;정우진;

    申请日2013-02-14

  • 分类号G02B3;G02B3/08;B82Y40;

  • 国家 KR

  • 入库时间 2022-08-21 15:40:08

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号