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OPTICAL APPARATUSES INCLUDING METAL-ASSISTED CHEMICAL ETCHING METHOD USING VERTICAL NANOWIRES AND THE METHOD FOR MANUFACTURING THE SAME.
OPTICAL APPARATUSES INCLUDING METAL-ASSISTED CHEMICAL ETCHING METHOD USING VERTICAL NANOWIRES AND THE METHOD FOR MANUFACTURING THE SAME.
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机译:光学设备包括使用垂直纳米线的金属辅助化学刻蚀方法及其制造方法。
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摘要
The present invention relates to a manufacturing method for an optical apparatus, etc. using a vertical nanostructure, which comprises: a step of preparing at least one substrate among a single crystal semiconductor substrate such as Si and Ge, a III-V compound semiconductor substrate such as GaAs and InP, and a silicon on insulator (SOI); a step of patterning a desired vertical nanostructure on the washed substrate using one or more methods between a lithography method and a self-assembly template method; a step of depositing catalyst metal, which includes one among gold, silver, platinum, and two or more combinations thereof, on the upper part of the substrate in a reverse pattern of the vertical nanostructure to be finally completed; and a step of manufacturing the vertical nanostructure using a metal catalyst etching method which is to submerge into a solution where hydrofluoric acid (HF) and hydrogen peroxide (H_2O_2) are mixed. Therefore, the manufacturing method can easily manufacture fine and elaborate patterns by manufacturing a grid structure using the metal catalyst etching method. The optical apparatus with a SWG nanostructure manufactured thereby can provide more effective performance than a structure manufactured by an existing dry etching method.
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