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RETICLE CHUCK CLEANER AND RETICLE CHUCK CLEANING METHOD

机译:十字盘清洁器和十字盘清洁方法

摘要

There is provided a reticle chuck cleaner A for cleaning a reticle chuck of an apparatus, as a reticle chuck cleaner that allows easy cleaning of a reticle chuck in a vacuum chamber of an apparatus without exposing the chamber to the atmosphere and contributes to improvement of the operating ratio of the apparatus, including: an adhesive layer 1 to be adhered to a chuck region of the reticle chuck; a support layer 2 laminated on the adhesive layer 1; and a substrate 3 having a shape capable of being carried to the reticle chuck, the support layer 2 and the substrate 3 being partially bonded together in an adhesive region 41 of a partial adhesive layer 4.
机译:提供一种用于清洁设备的掩模版卡盘的掩模版吸盘清洁器A,作为一种掩模版吸盘清洁器,其允许容易地清洁设备的真空室中的掩模版吸盘而不将腔室暴露于大气并且有助于改进该掩模版吸盘清洁器A。该装置的工作比率,包括:粘附层1,其将被粘附到掩模版卡盘的卡盘区域;支撑层2层压在粘合剂层1上;支撑层2和衬底3在部分粘合层4的粘合区域41中部分地粘合在一起,并且具有能够被承载到掩模版卡盘上的形状的衬底3。

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