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Etching solution for two layer of copper/molybdenum or three layer of molybdenum/copper/molybdenum without damage of glass substrate
Etching solution for two layer of copper/molybdenum or three layer of molybdenum/copper/molybdenum without damage of glass substrate
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机译：两层铜/钼或三层钼/铜/钼的蚀刻溶液，不会损坏玻璃基板
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摘要
liquid crystal display of the TFT (Thin Film Transitor) a configuration in which the gate (Gate), the source (Source) and drain (Drain) electrode for a photoresist (Photoresist) coating the exposed after etching to etch composition for thin film transistor liquid crystal display device that makes it possible to obtain a desired pattern (Pattern) is a metal wiring material is disclosed. Due to this etching composition is based on the total weight of the composition, 5 to 20% by weight hydrogen peroxide, 0.1 to 5% by weight etchant, a chelating agent 0.1 to 5% by weight, 0.1 to 5% by weight ammonium compound, 0.01 to 2 azole compound % by weight and the total weight including the water to be 100% by weight. The pH of this etching composition is adjusted to 1.0 to 3.5. According to the present invention, a copper / molybdenum film or a molybdenum / copper / molybdenum tunica media of the batch 3, as well as eliminate the poor etching is possible, the possibility that may be caused by the etching of the glass substrate by a fluoride while the residue does not occur, the process for the etch rate, etch and has the right amount and the right taper angle of inclination (Taper Angle). ; 展开▼
