首页> 外国专利> COMPOSITION FOR FORMING FERROELECTRIC THIN FILM, METHOD FOR FORMING FERROELECTRIC THIN FILM, FERROELECTRIC THIN FILM, AND COMPLEX ELECTRONIC COMPONENT

COMPOSITION FOR FORMING FERROELECTRIC THIN FILM, METHOD FOR FORMING FERROELECTRIC THIN FILM, FERROELECTRIC THIN FILM, AND COMPLEX ELECTRONIC COMPONENT

机译:形成铁电薄膜的组合物,形成铁电薄膜的方法,铁电薄膜和复合电子元件

摘要

A composition for forming a ferroelectric thin film is a composition for forming a ferroelectric thin film consisting of a lead titanate-based perovskite film or a lead zirconate titanate-based complex perovskite film. The composition includes lead acetate, a stabilizing agent consisting of acetylacetone or diethanolamine, and polyvinylpyrrolidone. The ratio of the molar number of the monomer-converted polyvinylpyrrolidone to the molar number of the perovskite B site atoms included in the composition is more than 0 and less than 0.015. The weight-average molecular weight ofthe polyvinylpyrrolidone is 5,000 to 100,000.
机译:用于形成铁电薄膜的组合物是用于形成由钛酸铅基钙钛矿膜或锆酸钛酸铅基复合钙钛矿膜组成的铁电薄膜的组合物。该组合物包括乙酸铅,由乙酰丙酮或二乙醇胺组成的稳定剂和聚乙烯吡咯烷酮。包含在组合物中的单体转化的聚乙烯吡咯烷酮的摩尔数与钙钛矿B位点原子的摩尔数之比大于0且小于0.015。聚乙烯吡咯烷酮的重均分子量为5,000至100,000。

著录项

  • 公开/公告号IN2012DE03621A

    专利类型

  • 公开/公告日2014-08-01

    原文格式PDF

  • 申请/专利权人

    申请/专利号IN3621/DEL/2012

  • 发明设计人 FUJII JUN;SAKURAI HIDEAKI;SOYAMA NOBUYUKI;

    申请日2012-11-26

  • 分类号H01L21/02;

  • 国家 IN

  • 入库时间 2022-08-21 15:57:41

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