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Apparatus for PECVD deposition of an internal barrier layer on a receptacle, the apparatus including an optical plasma analysis device
Apparatus for PECVD deposition of an internal barrier layer on a receptacle, the apparatus including an optical plasma analysis device
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机译：在容器上进行PECVD沉积内部阻挡层的设备，该设备包括光学等离子体分析装置
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摘要
An apparatus (1) for PECVD deposition of a thin layer of a barrier-effect material in a receptacle (3), the apparatus comprising: a structure (5) receiving the receptacle (3), said structure (5) defining a plasma-presence zone (18), said structure (5) being provided with an orifice (14) defining an axis (A1) and presenting an inside opening (15) opening out into the plasma-presence zone (18), and an outside opening (16) opening out outside said zone (18); an electromagnetic wave generator; and an optical plasma monitor device (19) including a pick-up (21) placed outside the plasma-presence zone (18) on the axis (A1) of said orifice.
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