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CO-OPTIMIZATION OF SCATTEROMETRY MARK DESIGN AND PROCESS MONITOR MARK DESIGN
CO-OPTIMIZATION OF SCATTEROMETRY MARK DESIGN AND PROCESS MONITOR MARK DESIGN
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机译：测度标记设计与过程监控标记设计的协同优化
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摘要
An automated method for co-optimizing a scatterometry mark and a process monitoring mark is provided. Embodiments include generating a series of pattern profiles on a photoresist on a wafer; providing the series of pattern profiles, resist process parameters, and scatterometry critical dimension parameters as inputs for a scatterometry measurement; performing scatterometry measurement to generate spectra from the series of pattern profiles; and optimizing a sensitivity precision correlation for the resist process parameter.
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