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PATH FOR PROBE OF SPECTROGRAPHIC METROLOGY SYSTEM

机译：光谱计量学系统的探索之路

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摘要

A method of operating a polishing system includes polishing a substrate at a polishing station, the substrate held by a carrier head during polishing, transporting the substrate to an in-sequence optical metrology system positioned between the polishing station and another polishing station or a transfer station, measuring a plurality of spectra reflected from the substrate with a probe of the optical metrology system while moving the carrier head to cause the probe to traverse a path across the substrate and while the probe remains stationary, the path across the substrate comprising either a plurality of concentric circles or a plurality of substantially radially aligned arcuate segments, and adjusting a polishing endpoint or a polishing parameter of the polishing system based on one or more characterizing values generated based on at least some of the plurality of spectra.

机译：一种操作抛光系统的方法，包括在抛光台上抛光衬底，在抛光过程中将衬底保持在承载头上，将衬底传输到位于抛光台和另一个抛光台或传送台之间的顺序光学计量系统中，用光学计量系统的探针测量从基板反射的多个光谱，同时移动载体头以使探针横穿基板上的路径，而探针保持静止时，穿过基板的路径包括多个同心圆或多个基本上径向对准的弓形段，并基于基于多个光谱中的至少一些光谱而产生的一个或多个特征值，调节抛光系统的抛光终点或抛光参数。

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公开/公告号US2014242879A1

专利类型
公开/公告日2014-08-28

原文格式PDF
申请/专利权人 APPLIED MATERIALS INC.;
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申请/专利号US201313777829
发明设计人 DOYLE E. BENNETT;THOMAS H. OSTERHELD;DAVID J. LISCHKA;JEFFREY DRUE DAVID;STEVEN M. ZUNIGA;BOGUSLAW A. SWEDEK;JUN QIAN;BENJAMIN CHERIAN;DOMINIC J. BENVEGNU;THOMAS LI;
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申请日2013-02-26
分类号B24B49/12;
国家 US
入库时间 2022-08-21 16:08:34

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