首页> 外国专利> ATMOSPHERIC PRESSURE PLASMA TREATMENT DEVICE, METHOD FOR MANUFACTURING ATMOSPHERIC PRESSURE PLASMA TREATMENT DEVICE, AND ATMOSPHERIC PRESSURE PLASMA TREATMENT METHOD

ATMOSPHERIC PRESSURE PLASMA TREATMENT DEVICE, METHOD FOR MANUFACTURING ATMOSPHERIC PRESSURE PLASMA TREATMENT DEVICE, AND ATMOSPHERIC PRESSURE PLASMA TREATMENT METHOD

机译:大气等离子处理装置,制造大气等离子处理装置的方法以及大气等离子处理方法

摘要

PROBLEM TO BE SOLVED: To provide: an atmospheric pressure plasma treatment device capable of suppressing abnormal discharge upon application of high voltage, and also capable of increasing a surface treatment effect; a method for manufacturing an atmospheric pressure plasma treatment device; and an atmospheric pressure plasma treatment method.;SOLUTION: There are provided: an atmospheric pressure plasma treatment device in which an electrode is formed on an outer peripheral surface of an insulator by spray coating; a method for manufacturing an atmospheric pressure plasma treatment device; and an atmospheric pressure plasma treatment method using the device.;COPYRIGHT: (C)2014,JPO&INPIT
机译:解决的课题:提供一种大气压等离子体处理装置,该大气压等离子体处理装置能够抑制施加高电压时的异常放电,并且能够提高表面处理效果。一种大气压等离子体处理装置的制造方法;解决方案:提供一种大气压等离子体处理装置,其中,通过喷涂在绝缘体的外周表面上形成电极。一种大气压等离子体处理装置的制造方法;以及使用该装置的常压等离子体处理方法。;版权所有:(C)2014,JPO&INPIT

著录项

  • 公开/公告号JP2014002937A

    专利类型

  • 公开/公告日2014-01-09

    原文格式PDF

  • 申请/专利权人 AIR WATER INC;

    申请/专利号JP20120137785

  • 发明设计人 SAWADA KOJI;OKUMURA NAOKI;

    申请日2012-06-19

  • 分类号H05H1/24;

  • 国家 JP

  • 入库时间 2022-08-21 16:14:01

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