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Being the constituent for chemical machine grinding which contains the iodate and the constituent for chemical machine

机译:是包含碘酸盐和化学机械成分的化学机械研磨成分

摘要

The invention provides compositions and methods for planarizing or polishing a substrate. The composition comprises an abrasive, iodate ion, a nitrogen-containing compound selected from the group consisting of a nitrogen-containing C4-20 heterocycle and a C1-20 alkylamine, and a liquid carrier comprising water.
机译:本发明提供了用于平坦化或抛光基底的组合物和方法。该组合物包含磨蚀性的碘酸根离子,选自含氮的C 4-20杂环和C 1-20烷基胺的含氮化合物以及包含水的液体载体。

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